摘要: Nitrogen-doped diamond-like carbon (N-DLC) films were synthesized by glow discharge plasma
enhanced chemical vapor deposition (PECVD) using a hybrid ion beam system. The influence of nitrogen
incorporation on the microstructure and electrochemical properties of N-DLC films was investigated by
scanning probe microscopy, Raman spectroscopy, X-ray photoemission spectroscopy and cycle voltam-
metry. Regardless of the deposition parameters, the surface of all the deposited films is very smooth.
Raman spectra show that ID/IG increases from 0.6 to 1.04 with the substrate bias voltage increases. XPS
results identify that carbon is bonded with nitrogen and the substrate bias makes no distinct contribution
to the N content in the films, even the N-DLC film at bias of −550 V has the lowest N–O bonds concen-
tration and the highest C–N bonds concentration. The film electrodes show the wide potential windows
range over 4 V, lower background currents in strong acid media. At the bias of −550 V, the N-DLC film
electrode not only exhibits the Ep at 209 mV and Iox /Ired at 0.8778 in K3 Fe(CN)6 solution, respectively, pp
but also illustrates a nearly reversible electrode reaction. The mechanism of electroproperties is discussed in terms of the atomic bond structures and diffusion process.
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期刊:
APPLIED SURFACE SCIENCE
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分类:
物理学
>>
普通物理:统计和量子力学,量子信息等
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引用:
ChinaXiv:201705.00503
(或此版本
ChinaXiv:201705.00503V1)
DOI:10.12074/201705.00503V1
CSTR:32003.36.ChinaXiv.201705.00503.V1
- 推荐引用方式:
Zhou, QK [Zhou, Quekai][ 1,2 ],Ke, PL [Ke, Peiling][ 2 ],Li, XW [Li, Xiaowei][ 2 ],Zou, YS [Zou, Yousheng][ 1 ],Wang, AY [Wang, Aiying][ 2 ].(2017).Microstructure and electrochemical properties of nitrogen-doped DLC films deposited by PECVD technique.中国科学院科技论文预发布平台.[ChinaXiv:201705.00503]
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