Improvement study on influence of plasma electrode edge on emittance of ECR ion source

分类： 物理学 >> 核物理学 提交时间： 2024-12-11

Deng, Dr. Qi Xie, Dr. Xiu-Cui liu, Prof. yonghao Li, Prof. Deming

摘要： In the design of extraction systems for intense ion sources, particularly Electron Cyclotron Resonance (ECR) ion sources, overall configuration of electrodes is the main consideration. However, a detailed aspect has not received sufficient attention, that is, the influence of the front edge of plasma electrode. Near this edge, direction of electric field changes abruptly, causing ions subjected to these electric field forces to move aberrantly, which subsequently increases the emittance of ion beam. The extent of this phenomenon may be underestimated. By chamfering the front edge, emittance is significantly improved. Two types of chamfering have been investigated and both perform well. It is suggested that chamfering be a practical way in designing plasma electrode and improving emittance.

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